Semiconductor devices and methods for manufacturing the same

ABSTRACT

Semiconductor devices and methods for manufacturing the same are disclosed. In one embodiment, the method comprises: forming a first shielding layer on a substrate, and forming a first spacer on a sidewall of the first shielding layer; forming one of source and drain regions with the first shielding layer and the first spacer as a mask; forming a second shielding layer on the substrate, and removing the first shielding layer; forming the other of the source and drain regions with the second shielding layer and the first spacer as a mask; removing at least a portion of the first spacer; and forming a gate dielectric layer, and forming a gate conductor in the form of spacer on a sidewall of the second shielding layer or on a sidewall of a remaining portion of the first spacer.

CROSS-REFERENCE TO RELATED APPLICATION(S)

This application claims priority to Chinese Application No.201210150203.X, entitled “SEMICONDUCTOR DEVICES AND METHODS FORMANUFACTURING THE SAME,” filed on May 15, 2012, which is incorporatedherein by reference in their entirety.

TECHNICAL FIELD

The present disclosure relates to the semiconductor field, andparticularly, to semiconductor devices and methods for manufacturing thesame.

BACKGROUND

With continuous scaling down of semiconductor devices, short channeleffects are becoming more significant. Thus, a gate stack configurationcomprising a high-K gate dielectric and a metal gate conductor isproposed. To avoid degradation of the gate stack, semiconductor deviceswith such a gate stack configuration are manufactured generally by meansof the replacement gate process. The replacement gate process involvesfilling the high-K dielectric and the metal gate conductor in a gapdefined between gate spacers. However, it is becoming more and moredifficult to fill the high-K dielectric and the metal gate conductor inthe small gap due to the scaling down of the semiconductor devices.

SUMMARY

The present disclosure provides, among others, semiconductor devices andmethods for manufacturing the same.

According to an aspect of the present disclosure, there is provided amethod for manufacturing a semiconductor device, comprising: forming afirst shielding layer on a substrate, and forming a first spacer on asidewall of the first shielding layer; forming one of source and drainregions with the first shielding layer and the first spacer as a mask;forming a second shielding layer on the substrate, and removing thefirst shielding layer; forming the other of the source and drain regionswith the second shielding layer and the first spacer as a mask; removingat least a portion of the first spacer; and forming a gate dielectriclayer, and forming a gate conductor in the form of spacer on a sidewallof the second shielding layer or on a sidewall of a remaining portion ofthe first spacer.

According to a further aspect of the present disclosure, there isprovided a method for manufacturing a semiconductor device, comprising:forming a first shielding layer on a substrate; forming one of sourceand drain regions with the first shielding layer as a mask; forming asecond shielding layer on the substrate, and removing at least a portionof the first shielding layer; forming a first spacer on a sidewall ofthe second shielding layer or on a sidewall of a remaining portion (ifany) of the first shielding layer; forming the other of the source anddrain regions with the second shielding layer, the remaining portion (ifany) of the first shielding layer and the first spacer as a mask;removing the first spacer; and forming a gate dielectric layer, andforming a gate conductor in the form of spacer on a sidewall of thesecond shielding layer or on a sidewall of the remaining portion of thefirst shielding layer.

According to a still further aspect of the present disclosure, there isprovided a semiconductor device, comprising: a substrate; and source anddrain regions and a gate stack formed on the substrate. The gate stackmay comprise: a gate dielectric layer; and a gate conductor, which isformed in the form of spacer on a sidewall of a dielectric layer or agate spacer on one side of the gate stack.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other objects, features, and advantages of the presentdisclosure will become apparent from following descriptions ofembodiments with reference to the attached drawings, in which:

FIGS. 1-9 are schematic views showing a flow of manufacturing asemiconductor device according to an embodiment of the presentdisclosure;

FIG. 10 is a schematic view showing a semiconductor device according toa further embodiment of the present disclosure;

FIGS. 11-17 are schematic views showing a flow of manufacturing asemiconductor device according to a further embodiment of the presentdisclosure;

FIGS. 18-20 are schematic views showing a flow of manufacturing asemiconductor device according to a further embodiment of the presentdisclosure;

FIG. 21 is a schematic view showing a semiconductor device according toa further embodiment of the present disclosure; and

FIGS. 22-26 are schematic views showing, in part, a flow ofmanufacturing a semiconductor device according to a further embodimentof the present disclosure.

DETAILED DESCRIPTION

Hereinafter, descriptions are given with reference to embodiments shownin the attached drawings. However, it is to be understood that thesedescriptions are illustrative and not intended to limit the presentdisclosure. Further, in the following, known structures and technologiesare not described to avoid obscuring the present disclosureunnecessarily.

In the drawings, various structures according to the embodiments areschematically shown. However, they are not drawn to scale, and somefeatures may be enlarged while some features may be omitted for sake ofclarity. Moreover, shapes and relative sizes and positions of regionsand layers shown in the drawings are also illustrative, and deviationsmay occur due to manufacture tolerances and technique limitations inpractice. Those skilled in the art can also devise regions/layers ofother different shapes, sizes, and relative positions as desired.

In the context of the present disclosure, when a layer/element isrecited as being “on” a further layer/element, the layer/element can bedisposed directly on the further layer/element, or otherwise there maybe an intervening layer/element interposed therebetween. Further, if alayeaelernent is “on” a further layer/element in an orientation, thenthe layer/element can be “under” the further layer/element when theorientation is turned.

In the conventional process, after source and drain regions are formedin a substrate with the aid of a “dummy” gate stack and spacers onopposite sides of the dummy gate stack, the spacers are reserved todefine a gap therebetween, and a true gate stack can be formed byfilling the gap. In contrast, the present disclosure proposes a“replacement spacer” process. Specifically, after source and drainregions are formed, material layer(s) present on the side of either oneof the source and drain regions is (are) reserved, and a gate stack(particularly, a gate conductor) is formed in the form of spacer on asidewall of the reserved material layer(s). In this way, formation ofthe gate stack is done in a relatively large space (substantiallycorresponding to a gate region+the other of the source and drainregions). This process is easier to perform as compared with theconventional process where formation of the gate stack is done in thesmall gap between the spacers.

The technology of the present disclosure can be implemented in variousways, some of which will be described in the following by way ofexample.

Firstly, a flow of manufacturing a semiconductor device according to anembodiment of the present disclosure is described with reference toFIGS. 1-9.

As shown in FIG. 1, a substrate 100 is provided. The substrate 100 maycomprise any suitable substrate, including, but not limited to, a bulksemiconductor substrate such as a bulk Si substrate, a Semiconductor OnInsulator (SOI) substrate, a SiGe substrate, and the like. In thefollowing, the substrate is described as a bulk Si substrate forconvenience. On the substrate 100, Shallow Trench Isolations (STIs) 102can be formed to isolate active regions of individual devices. Forexample, the STIs 102 may comprise oxide (e.g., silicon oxide). In thefollowing, formation of a single one device is described forconvenience. However, it is to be noted that the present disclosure isnot limited thereto, and is also applicable to formation of two or moredevices.

Next, as shown in FIG. 2, a thin oxide layer (e.g., silicon oxide) 104is optionally formed on a surface of the substrate 100 by means of e.g.deposition. For example, the oxide layer 104 may have a thickness ofabout 5-10 nm, and can be used to form an Interfacial Layer (IL)subsequently. On the substrate 100 (or on the oxide layer 104 in thecase where the oxide layer 104 is formed), a first shielding layer 106with a thickness of e.g. about 100-200 nm can be formed by means of e.g.deposition. For example, the first shielding layer 106 may comprisenitride (e.g. silicon nitride). The first shielding layer 106 can bepatterned by means of e.g. Reactive Ion Etching (RIE) to cover a portionof the active region (which portion substantially corresponds to a laterformed source or drain region).

In the case where the oxide layer 104 is formed, the oxide layer 104 canbe selectively etched with respect to the first shielding layer 106(e.g., nitride) and the substrate 100 (e.g., bulk Si), to form an IL 108with a thickness of e.g. about 0.5-1 nm, as shown in FIG. 3. Here, thedifference in thickness between the IL 108 and the oxide layer 104 isnot shown for convenience of illustration.

Further, as shown in FIG. 3, a first spacer 112 may be formed on asidewall of the first shielding layer 106. For example, the first spacer112 is formed to have a width of about 15-60 nm to cover a portion ofthe active region (which portion substantially corresponds to a laterformed gate region). The first spacer 112 may comprise polysilicon oramorphous silicon, for example. There are various ways to form thespacer, and detailed descriptions on formation of the spacer are omittedhere.

Thus, the first shielding layer 106 and the first spacer 112 expose aportion of the active region. Then, one of the source and drain regionscan be formed in the exposed portion of the active region by means of asource/drain formation process. For example, this can be done asfollows.

Specifically, as shown in FIG. 3 (especially, indicated by verticalarrows shown therein), extension implantation can be carried out to forman extension region 116. For example, for a p-type device, theimplantation can be done by implanting p-type impurities such as In, BF₂or B; for a n-type device, the implantation can be done by implantingn-type impurities such as As or P, to form the extension region. It isto be noted that the dashed line block 116 in FIG. 3 is shown as aregular rectangular shape for convenience of illustration. In practice,the profile of the extension region 116 depends on the process, and mayhave no definite boundaries. Further, to improve the performance, haloimplantation can be carried out before the extension implantation, asindicated by angled arrows in FIG. 3. For example, for a p-type device,the implantation can be done by implanting n-type impurities such as Asor P; for a n-type device, the implantation can be done by implantingp-type impurities such as In, BF₂ or B, to form a halo region (notshown).

Then, as indicated by arrows in FIG. 4, source/drain implantation can bedone to form a source/drain implantation region 118. For example, for ap-type device, the implantation can be done by implanting p-typeimpurities such as in, BF₂ or B; for a n-type device, the implantationcan be done by implanting n-type impurities such as As or P, to form thesource/drain implantation region. It is to be noted that the dashed lineblock 118 in FIG. 4 is shown as a regular rectangular shape forconvenience of illustration. In practice, the profile of thesource/drain implantation region 118 depends on the process, and mayhave no definite boundaries.

Next, as shown in FIG. 5, a second shielding layer 120 may be formed onthe substrate 100, to cover at least the above formed one of the sourceand drain regions. For example, the second shielding layer 120 maycomprise oxide (e.g., silicon oxide). Then, a planarization process suchas Chemical Mechanical Polishing (CMP) can be performed to expose thefirst shielding layer 106 and the first spacer 112 to facilitatefollowing processes.

Subsequently, as shown in FIG. 6, the first shielding layer 106 can beremoved by selectively etching the first shielding layer 106 (e.g.,silicon nitride) with respect to the first spacer 112 (e.g., polysiliconor amorphous silicon), and the second shielding layer 120 and the oxidelayer 104 (e.g., silicon oxide). The selective etching can be done byhot phosphoric acid, for example.

Thus, as shown in FIG. 6, the second shielding layer 120 and the firstspacer 112 expose a portion of the active region. Then, the other of thesource and drain regions can be formed in the exposed portion of theactive region by means of a source/drain formation process. For example,this can be done as follows.

Specifically, as shown in FIG. 6, extension implantation can be carriedout to form an extension region 124. For example, for a p-type device,the implantation can be done by implanting p-type impurities such as In,BF₂ or B; for a n-type device, the implantation can be done byimplanting n-type impurities such as As or P, to form the extensionregion. It is to be noted that the dashed line block 124 in FIG. 6 isshown as a regular rectangular shape for convenience of illustration. Inpractice, the profile of the extension region 124 depends on theprocess, and may have no definite boundaries. Further, to improve theperformance, halo implantation can be carried out before the extensionimplantation. For example, for a p-type device, the implantation can bedone by implanting n-type impurities such as As or P; for a n-typedevice, the implantation can be done by implanting p-type impuritiessuch as In, BF₂ or B, to form a halo region (not shown). After that,source/drain implantation can be done to form a source/drainimplantation region 126. For example, for a p-type device, theimplantation can be done by implanting p-type impurities such as In, BF₂or B; for a n-type device, the implantation can be done by implantingn-type impurities such as As or P, to form the source/drain implantationregion. It is to be noted that the dashed line block 126 in FIG. 6 isshown as a regular rectangular shape for convenience of illustration. Inpractice, the profile of the source/drain implantation region 126depends on the process, and may have no definite boundaries.

Next, as shown in FIG. 7, annealing, such as spike annealing, laserannealing, and flash annealing, can be performed to activate theimplanted impurities, to form final source and drain regions 128. Then,the first spacer 112 can be removed by selective etching. For example,the first spacer 112 (e.g., polysilicon or amorphous silicon) may beselectively removed by means of a TMAH solution. As a result, arelatively large space (substantially corresponding to the gateregion+the other of the source and drain regions) is reserved on theside of the second shielding layer 120, so that it is easy to form agate stack.

Then, as shown in FIG. 8, the gate stack can be formed. Specifically, agate dielectric layer 130 can be formed by means of e.g. deposition. Forexample, the gate dielectric layer 130 may comprise a high-K gatedielectric material such as HfO₂, with a thickness of about 2-4 nm.Optionally, an IL can be rebuilt before formation of the gate dielectriclayer 130. For example, the IL (not shown) can be formed by selectivelyetching the oxide layer 104, as described above with reference to FIG.3. On the gate dielectric layer 130, a gate conductor 134 can be formedin the form of spacer. In formation of the gate conductor, parametersadopted in the spacer formation process, such as deposition thicknessand RIE parameters, can be controlled to locate the gate conductor 134in the form of spacer substantially between the underlying source anddrain regions formed as described above. For example, the gate conductor134 may comprise a metal gate conductor material, such as Ti, Co, Ni,Al, W, or any alloy thereof. Preferably, there may be a work functionadjustment layer 132 sandwiched between the gate dielectric layer 130and the gate conductor 134. For example, the work function adjustmentlayer 132 may comprise any one of TaC, TiN, TaTbN, TaErN, TaYbN, TaSiN,HfSiN, MoSiN, RuTa, NiTa, MoN, TiSiN, TiCN, TaAlC, TiAlN, TaN, PtSi,Ni₃Si, Pt, Ru, Ir, Mo, HfRu, RuO_(x), or any combination thereof, with athickness of about 2-10 nm.

After that, as shown in FIG. 9, a dielectric layer 136 can be formed bymeans of e.g. deposition, and planarized by means of e.g., CMP. Thedielectric layer 136 may comprise oxide (e.g., silicon oxide), nitrideor any combination thereof. Then, peripheral components such as contactscan be formed, and detailed descriptions thereof are omitted here.

Thus, an illustrative semiconductor device according to the presentdisclosure is achieved. As shown in FIG. 9, the semiconductor device maycomprise the source and drain regions (128) and the gate stack (130,132, 134) formed on the substrate. The gate stack, especially, the gateconductor 134, is formed in the form of spacer on the sidewall of theshielding layer (or, a dielectric layer) 120 on one side (the left sidein the example shown in FIG. 9) of the gate stack.

FIG. 10 is a schematic view showing a semiconductor device according toa further embodiment of the present disclosure. The semiconductor deviceshown in FIG. 10 differs from that shown in FIG. 9 in that: the gatestack, especially, the gate conductor 134, is formed in the form ofspacer on a sidewall of a second spacer 114 on one side (the left sidein the example shown in FIG. 10) of the gate stack.

The device shown in FIG. 10 can be manufactured according to the processdescribed above with reference to FIGS. 1-9. For example, the secondspacer 114 can be additionally formed on the sidewall of the secondshielding layer 120 after the first spacer 112 is removed (referring tothe above descriptions in conjunction with FIG. 7). The second spacer114 may comprise nitride (e.g., silicon nitride), with a thickness ofabout 5-20 nm. Alternatively, the second spacer 114 may be formed by thefirst spacer 112 which is partially removed in the process of removingthe first spacer 112 (referring to the above descriptions in conjunctionwith FIG. 7), or may be formed on a sidewall of the first spacer 112(referring to FIG. 4) in which case the second shielding layer 120 isformed on a sidewall of the second spacer 114 (referring to FIG. 5).

Next, a flow of manufacturing a semiconductor device according to afurther embodiment of the present disclosure is described with referenceto FIGS. 11-17. Similar or like reference symbols in FIGS. 11-17 denotesimilar or like components as those shown in FIGS. 1-9. In thefollowing, descriptions are mainly directed to differences between thisembodiment and the above described embodiments.

As shown in FIG. 11, a substrate 1000 is provided. On the substrate1000, STIs 1002 can be formed. Optionally, a thin oxide layer 1004 isformed on a surface of the substrate 1000. For details of the substrate1000 and the oxide layer 1004, reference may be made to the abovedescriptions on the substrate 100 and the oxide layer 104 in conjunctionwith FIGS. 1-2.

On the substrate 1000 (or on the oxide layer 1004 in the case where theoxide layer 1004 is formed), a first shielding layer 1006 with athickness of e.g. about 100-200 nm can be formed by means of e.g.deposition. For example, the first shielding layer 1006 may comprisenitride (e.g. silicon nitride). The first shielding layer 1006 can bepatterned by means of e.g. RIE to cover a portion of the active region(which portion substantially corresponds to a later formed source ordrain region).

According to an embodiment, for better control of short channel effectsand suppression of band-to-band leakage, a Super-Steep-Retrograded Well(SSWR) 1010 can be formed by ion implantation (indicated by arrows), asshown in FIG. 11. For example, for a p-type device, the implantation canbe done by implanting n-type impurities such as As, P, or Sb; for an-type device, the implantation can be done by implanting p-typeimpurities such as In, BF₂ or B, to form the SSWR. It is to be notedthat the dashed line block 1010 in FIG. 11 is shown as a regularrectangular shape for convenience of illustration. In practice, theprofile of the SSWR 1010 depends on the process, and may have nodefinite boundaries.

Subsequently, as shown in FIG. 12, a first sub-spacer 1012 may be formedon a sidewall of the first shielding layer 1006. For example, the firstsub-spacer 1012 is formed to have a width of about 5-50 nm to cover aportion of the active region (which portion substantially corresponds toa later formed gate region). The first sub-spacer 1012 may comprisepolysilicon or amorphous silicon, for example. On a sidewall of thefirst sub-spacer 1012, a second sub-spacer 1014 may be formed. Forexample, the second sub-spacer 1014 may comprise oxide (e.g., siliconoxide), with a dimension substantially corresponding to a gate spacer(e.g., with a width of about 5-20 nm). There are various ways to formthe spacers, and detailed descriptions on formation of the spacers areomitted here.

Thus, the first shielding layer 1006 and a first spacer (including thefirst sub-spacer 1012 and the second sub-spacer 1014) expose a portionof the active region. Then, one of the source and drain regions can beformed in the exposed portion of the active region by means of asource/drain formation process. For example, a halo region (not shown),an extension region 1016 and a source/drain implantation region 1018 canbe formed according to the process described above in conjunction withFIGS. 3 and 4. For details of the halo region, the extension region 1016and the source/drain implantation region 1018, reference may be made tothe above descriptions in conjunction with FIGS. 3 and 4.

Next, as shown in FIG. 13, a second shielding layer 1020 may be formedon the substrate, to cover at least the above formed one of the sourceand drain regions. For example, the second shielding layer 120 maycomprise oxide (e.g., silicon oxide). Then, a planarization process suchas Chemical Mechanical Polishing (CMP) can be performed to expose thefirst shielding layer 1006 and the first spacer (including the firstsub-spacer 1012 and the second sub-spacer 1014) to facilitate followingprocesses (as described above in conjunction with FIG. 5).

Subsequently, as shown in FIG. 14, the first shielding layer 1006 can beremoved by selectively etching (as described above in conjunction withFIG. 6). Then, a second spacer 1022 can be formed on a sidewall of thefirst sub-spacer 1012. For example, the second spacer 1022 may comprisenitride (e.g., silicon nitride), with a dimension substantiallycorresponding to a gate spacer (e.g., with a width of about 5-20 nm).

Thus, as shown in FIG. 14, the second shielding layer 120, the firstspacer (including the first sub-spacer 1012 and the second sub-spacer1014), and the second spacer 1022 expose a portion of the active region.Then, the other of the source and drain regions can be formed in theexposed portion of the active region by means of a source/drainformation process, For example, a halo region (not shown), an extensionregion 1024 and a source/drain implantation region 1026 can be formedaccording to the process described above in conjunction with FIG. 6. Fordetails of the halo region, the extension region 1024 and thesource/drain implantation region 1026, reference may be made to theabove descriptions in conjunction with FIG. 6.

Next, as shown in FIG. 15, annealing, such as spike annealing, laserannealing, and flash annealing, can be performed to activate theimplanted impurities, to form final source and drain regions 1028.

Subsequently, the second spacer 1022 and a portion of the first spacer(specifically, the first sub-spacer 1012) can be removed by selectiveetching to leave the second sub-spacer 1014 remained. For example, thesecond spacer 1022 (e.g., silicon nitride) may be selectively removed byhot phosphoric acid, and the first sub-spacer 1012 (e.g., polysilicon oramorphous silicon) may be selectively removed by means of a TMAHsolution. As a result, a relatively large space (substantiallycorresponding to the gate region+the other of the source and drainregions) is reserved on the side of the second sub-spacer 1014, so thatit is easy to form a gate stack.

Then, as shown in FIG. 16, the gate stack can be formed. Specifically, agate dielectric layer 1030, a work function adjustment layer 1032, and agate conductor 1034 in the form of spacer can be formed sequentially (asdescribed above in conjunction with FIG. 8). After that, a dielectriclayer 1036 can be formed by means of e.g. deposition, and planarized bymeans of e.g., CMP. The dielectric layer 1036 may comprise oxide (e.g.,silicon oxide), nitride or any combination thereof (as described abovein conjunction with FIG. 9).

Next, as shown in FIG. 17, contacts 1038 corresponding to the source anddrain regions can be formed. For example, the contacts 1038 may comprisemetal such as W or Cu. According to an embodiment, to improve the ohmiccontact, a metal silicide layer 1036 may be formed in the source anddrain regions, so that the contacts 1038 are in electrical contact withthe source and drain regions via the metal silicide layer 1036. Forexample, the metal silicide layer 1036 may comprise NiPtSi. There arevarious ways to form the metal silicide layer 1036 and the contacts1038, and detailed descriptions thereof are omitted here.

Thus, an illustrative semiconductor device according to the presentdisclosure is achieved. As shown in FIG. 17, the semiconductor devicemay comprise the source and drain regions (1028) and the gate stack(1030, 1032, 1034) formed on the substrate. On one side (the left sidein the example shown in FIG. 17) of the gate stack, there is the gatespacer 1014. The gate stack, especially, the gate conductor 134, isformed in the form of spacer on the sidewall of the second sub-spacer(or the gate spacer) 1014. The semiconductor device may comprise theasymmetric SSWR 1010, which extends in the substrate under the gatestack and extends to the source or drain region on the one side of thegate stack.

Next, a flow of manufacturing a semiconductor device according to afurther embodiment of the present disclosure is described with referenceto FIGS. 18-20. Similar or like reference symbols in FIGS. 18-20 denotesimilar or like components as those shown in FIGS. 1-10. In thefollowing, descriptions are mainly directed to differences between thisembodiment and the above described embodiments.

As shown in FIG. 18, a substrate 200 is provided. On the substrate 200,STIs 202 can be formed. Optionally, a thin oxide layer 204 is formed ona surface of the substrate 200. For details of the substrate 200 and theoxide layer 204, reference may be made to the above descriptions on thesubstrate 100 and the oxide layer 104 in conjunction with FIGS. 1-2.

On the substrate 200 (or on the oxide layer 204 in the case where theoxide layer 204 is formed), a first shielding layer 206 with a thicknessof e.g. about 100-200 nm can be formed by means of e.g. deposition. Forexample, the shielding layer 206 may comprise nitride (e.g. siliconnitride). The shielding layer 206 can be patterned by means of e.g. RIEto expose a portion of the active region (which portion substantiallycorresponds to a later formed source or drain region). Then, one of thesource and drain regions can be formed in the exposed portion of theactive region by means of a source/drain formation process. For example,a halo region (not shown), an extension region 216 and a source/drainimplantation region 218 can be formed according to the process describedabove in conjunction with FIGS. 3 and 4. For details of the halo region,the extension region 216 and the source/drain implantation region 218,reference may be made to the above descriptions in conjunction withFIGS. 3 and 4.

Next, as shown in FIG. 19, a second shielding layer 220 may be formed onthe substrate, to cover at least the above formed one of the source anddrain regions. For example, the second shielding layer 220 may compriseoxide (e.g., silicon oxide). Then, a planarization process such as CMPcan be performed to expose the first shielding layer 206, which then canbe removed by selective etching. Then, a first spacer 212 may be formedon a sidewall of the second shielding layer 220. For example, the firstspacer 212 may be formed to have a width of about 15-60 nm, to cover aportion of the active region (which portion substantially corresponds toa later formed gate region). The first spacer 212 may comprisepolysilicon or amorphous silicon, for example.

Thus, the second shielding layer 220 and the first spacer 212 expose aportion of the active region. Then, the other of the source and drainregions can be formed in the exposed portion of the active region bymeans of a source/drain formation process. For example, a halo region(not shown), an extension region 224 and a source/drain implantationregion 226 can be formed according to the process described above inconjunction with FIG. 6. For details of the halo region, the extensionregion 224 and the source/drain implantation region 226, reference maybe made to the above descriptions in conjunction with FIG. 6.

Next, as shown in FIG. 20, annealing, such as spike annealing, laserannealing, and flash annealing, can be performed to activate theimplanted impurities, to form final source and drain regions 228.

Subsequently, the first spacer 212 can be removed by selective etching.For example, the first spacer 212 (e.g., polysilicon or amorphoussilicon) may be selectively removed by means of a TMAH solution. As aresult, a relatively large space (substantially corresponding to thegate region+the other of the source and drain regions) is reserved onthe side of the second shielding layer 220, so that it is easy to form agate stack. For example, a gate dielectric layer 230, a work functionadjustment layer 232, and a gate conductor 234 in the form of spacer canbe formed sequentially (as described above in conjunction with FIG. 8).The device shown in FIG. 20 is substantially same in structure as thedevice shown in FIG. 8. After that, a dielectric layer (referring to 236shown in FIG. 21) can be deposited and planarized, and peripheralcomponents such as contacts can be formed. Detailed descriptions thereofare omitted here.

Though the above descriptions in conjunction with the embodiment shownin FIGS. 18-20 do not involve an IL, operations for forming the IL canbe done as described in the above embodiments.

FIG. 21 is a schematic view showing a semiconductor device according toa further embodiment of the present disclosure. The semiconductor deviceshown in FIG. 21 differs from that shown in FIG. 20 in that: the gatestack, especially, the gate conductor 234, is formed in the form ofspacer on a sidewall of a second spacer 214 on one side (the left sidein the example shown in FIG. 21) of the gate stack.

The device shown in FIG. 21 can be manufactured according to the processdescribed above with reference to FIGS. 18-20. For example, the secondspacer 214 can be additionally formed on the sidewall of the secondshielding layer 220 after the first spacer 212 is removed (referring tothe above descriptions in conjunction with FIG. 20). The second spacer214 may comprise nitride (e.g., silicon nitride), with a thickness ofabout 5-20 nm. Alternatively, the second spacer 214 may be formed by thefirst shielding layer 206 which is partially removed in the process ofremoving the first shielding layer 206 (referring to the abovedescriptions in conjunction with FIG. 19), or may be formed on asidewall of the second shielding layer 220 in which case the firstspacer 212 is formed on a sidewall of the second spacer 214 (referringto FIG. 19).

Next, a flow of manufacturing a semiconductor device according to afurther embodiment of the present disclosure is described with referenceto FIGS. 22-26. Similar or like reference symbols in FIGS. 22-26 denotesimilar or like components as those shown in FIGS. 1-10. In thefollowing, descriptions are mainly directed to differences between thisembodiment and the above described embodiments.

As shown in FIG. 22, a substrate 2000 is provided. On the substrate2000, STIs 2002 can be formed. Optionally, a thin oxide layer 2004 isformed on a surface of the substrate 2000. For details of the substrate2000 and the oxide layer 2004, reference may be made to the abovedescriptions on the substrate 100 and the oxide layer 104 in conjunctionwith FIGS. 1-2.

On the substrate 2000 (or on the oxide layer 2004 in the case where theoxide layer 2004 is formed), a first shielding sub-layer 2006 with athickness of e.g. about 100-200 nm can be formed by means of e.g.deposition. For example, the first shielding sub-layer 2006 may comprisenitride (e.g. silicon nitride). On a sidewall of the first shieldingsub-layer 2006, a first sub-spacer 2014 can be formed. For example, thefirst sub-spacer 2014 may comprise oxide (e.g., silicon oxide), with adimension substantially corresponding to a gate spacer (e.g., with awidth of about 5-20 nm). Thus, the first shielding sub-layer 2006 and afirst sub-spacer 2014 expose a portion of the active region (whichportion substantially corresponds to a later formed source or drainregion). Then, one of the source and drain regions can be formed in theexposed portion of the active region by means of a source/drainformation process. For example, a halo region (not shown), an extensionregion 2016 and a source/drain implantation region 2018 can be formedaccording to the process described above in conjunction with FIGS. 3 and4. For details of the halo region, the extension region 2016 and thesource/drain implantation region 2018, reference may be made to theabove descriptions in conjunction with FIGS. 3 and 4.

Next, as shown in FIG. 23, a second shielding layer 2020 may be formedon the substrate, to cover at least the above formed one of the sourceand drain regions. For example, the second shielding layer 120 maycomprise oxide (e.g., silicon oxide). Then, a planarization process suchas CMP can be performed to expose the first shielding sub-layer 2006 andthe first sub-spacer 2014. The first shielding sub-layer 2006 can beremoved by selective etching.

According to an embodiment, for better control of short channel effectsand suppression of band-to-band leakage, a SSWR 2010 can be formed byion implantation, as shown in FIG. 23. For details of the SSWR 2010,reference may be made to the above descriptions in conjunction with FIG.11.

Subsequently, as shown in FIG. 24, a second sub-spacer 2012 may beformed on a sidewall of the first sub-spacer 2014. For example, thesecond sub-spacer 2012 is formed to have a width of about 5-50 nm tocover a portion of the active region (which portion substantiallycorresponds to a later formed gate region). The second sub-spacer 1012may comprise polysilicon or amorphous silicon, for example. On asidewall of the second sub-spacer 2012, a third sub-spacer 2022 may beformed. For example, the third sub-spacer 2022 may comprise nitride(e.g., silicon nitride), with a dimension substantially corresponding toa gate spacer (e.g., with a width of about 5-20 nm). Thus, the secondshielding layer 2020, the first sub-spacer 2014, the second sub-spacer2012, and the third sub-spacer 2022 expose a portion of the activeregion. Then, the other of the source and drain regions can be formed inthe exposed portion of the active region by means of a source/drainformation process. For example, a halo region (not shown), an extensionregion 2024 and a source/drain implantation region 2026 can be formedaccording to the process described above in conjunction with FIG. 6. Fordetails of the halo region, the extension region 2024 and thesource/drain implantation region 2026, reference may be made to theabove descriptions in conjunction with FIG. 6.

Next, as shown in FIG. 25, annealing, such as spike annealing, laserannealing, and flash annealing, can be performed to activate theimplanted impurities, to form final source and drain regions 2028.

Subsequently, the second sub-spacer 2012 and the third sub-spacer 2022can be removed by selective etching to leave the first sub-spacer 2014remained. For example, the second sub-spacer 2012 (e.g., polysilicon oramorphous silicon) may be selectively removed by means of a TMAHsolution, and the third sub-spacer 2022 (e.g., silicon nitride) may beselectively removed by hot phosphoric acid. As a result, a relativelylarge space (substantially corresponding to the gate region+the other ofthe source and drain regions) is reserved on the side of the firstsub-spacer 2014, so that it is easy to form a gate stack.

The flow can continue similarly to that shown in FIG. 16, and detaileddescriptions thereof are omitted here. For example, the gate stack(including a gate dielectric layer 2030, a work function adjustmentlayer 2032, and a gate conductor 2034 in the form of spacer) and adielectric layer 2036 can be formed. The resultant device is similar tothat shown in FIG. 16, except that the SSWR 2010 extends to the oppositeside.

Though the above descriptions in conjunction with the embodiment shownin FIGS. 22-26 do not involve an IL, operations for forming the IL canbe done as described in the above embodiments.

In the above descriptions, details of patterning and etching of thelayers are not described. It is to be understood by those skilled in theart that various measures may be utilized to form the layers and regionsin desired shapes. Further, to achieve the same feature, those skilledin the art can devise processes not entirely the same as those describedabove. The mere fact that the various embodiments are describedseparately does not mean that means recited in the respectiveembodiments cannot be used in combination to advantage.

From the foregoing, it will be appreciated that specific embodiments ofthe disclosure have been described herein for purposes of illustration,but that various modifications may be made without deviating from thedisclosure. In addition, many of the elements of one embodiment may becombined with other embodiments in addition to or in lieu of theelements of the other embodiments. Accordingly, the technology is notlimited except as by the appended claims.

1. A method for manufacturing a semiconductor device, comprising:forming a first shielding layer on a substrate, and forming a firstspacer on a sidewall of the first shielding layer; forming one of sourceand drain regions with the first shielding layer and the first spacer asa mask; forming a second shielding layer on the substrate, and removingthe first shielding layer; forming the other of the source and drainregions with the second shielding layer and the first spacer as a mask;removing at least a portion of the first spacer; and forming a gatedielectric layer, and forming a gate conductor in the form of spacer ona sidewall of the second shielding layer or on a sidewall of a remainingportion of the first spacer.
 2. The method according to claim 1, whereinforming the first spacer comprises: forming a first sub-spacer on thesidewall of the first shielding layer; and forming a second sub-spaceron a sidewall of the first sub-spacer.
 3. The method according to claim2, wherein forming the other of the source and drain regions comprises:forming a second spacer on a sidewall of the first spacer; and formingthe other of the source and drain regions with the second shieldinglayer, the first spacer and the second spacer as a mask.
 4. The methodaccording to claim 3, wherein removing at least a portion of the firstspacer comprises: removing the second spacer and the first sub-spacer.5. The method according to claim 3, wherein the first shielding layercomprises nitride, the second shielding layer comprises oxide, the firstsub-spacer comprises polysilicon or amorphous silicon, the secondsub-spacer comprises oxide, and the second spacer comprises nitride. 6.The method according to claim 1, further comprising: forming asuper-steep-retrograded well in the substrate with the first shieldinglayer as a mask.
 7. The method according to claim 1, wherein forming thesource or drain region comprises: performing extension implantation; andperforming source/drain implantation.
 8. The method according to claim7, wherein forming the source or drain region comprises: performing haloimplantation.
 9. The method according to claim 1, further comprising:forming an interfacial layer on the substrate.
 10. A method formanufacturing a semiconductor device, comprising: forming a firstshielding layer on a substrate; forming one of source and drain regionswith the first shielding layer as a mask; forming a second shieldinglayer on the substrate, and removing at least a portion of the firstshielding layer; forming a first spacer on a sidewall of the secondshielding layer or on a sidewall of a remaining portion of the firstshielding layer; forming the other of the source and drain regions withthe second shielding layer, the possible remaining portion of the firstshielding layer and the first spacer as a mask; removing the firstspacer; and forming a gate dielectric layer, and forming a gateconductor in the form of spacer on a sidewall of the second shieldinglayer or on a sidewall of the remaining portion of the first shieldinglayer.
 11. The method according to claim 10, wherein forming the firstshielding layer comprises: forming a first shielding sub-layer; andforming a first sub-spacer on a sidewall of the first shieldingsub-layer.
 12. The method according to claim 11, wherein removing atleast a portion of the first shielding layer comprises: removing thefirst shielding sub-layer.
 13. The method according to claim 12, whereinforming the first spacer comprises: forming a second sub-spacer on asidewall of the first sub-spacer; and forming a third sub-spacer on asidewall of the second sub-spacer.
 14. The method according to claim 13,wherein the first shielding layer comprises nitride, the secondshielding layer comprises oxide, the first sub-spacer comprises oxide,the second sub-spacer comprises polysilicon or amorphous silicon, andthe third sub-spacer comprises nitride.
 15. The method according toclaim 11, further comprising: forming a super-steep-retrograded well inthe substrate with the second shielding layer and the first sub-spaceras a mask.
 16. A semiconductor device, comprising: a substrate; andsource and drain regions and a gate stack formed on the substrate,wherein the gate stack comprises: a gate dielectric layer; and a gateconductor, which is formed in the form of spacer on a sidewall of adielectric layer or a gate spacer on one side of the gate stack.
 17. Thesemiconductor device according to claim 16, wherein the gate dielectriclayer comprises a high-K dielectric material, and the gate conductorcomprises a metal gate conductor material.
 18. The semiconductor deviceaccording to claim 16, further comprising a work function adjustmentlayer disposed between the gate dielectric layer and the gate conductor.19. The semiconductor device according to claim 18, wherein the workfunction adjustment layer comprises any one of TaC, TiN, TaTbN, TaErN,TaYbN, TaSiN, HfSiN, MoSiN, RuTa, NiTa, MoN, TiSiN, TiCN, TaAlC, TiAlN,TaN, PtSi, Ni₃Si, Pt, Ru, Ir, Mo, HfRu, RuO_(x), or any combinationthereof.
 20. The semiconductor device according to claim 16, furthercomprising a super-steep-retrograded well formed in the substrate, whichextends to either the source side or the drain side.